EFFECT OF THE CONCENTRATION OF CHLORIDE ION IN THE STRUCTURE OF ELECTRODEPOSITS OF COPPER

Authors

  • Juan Alejandro Aragón Maureira Profesor Departamento de Ingenierí­a.
  • Juan Alejandro Camus Arancibia Profesor del Departamento de Quimica de la Universidad de Playa Ancha

Abstract

Metallography analysis of deposits of copper obtained from acidic solutions of copper sulphate, when changing the concentration of chloride, between 20 - 50 mg/L, allows to corroborate that the deposit of coarse-grained of type "crystals that reproduce the base" (RB) initial, begins to tune it to a growth of texture oriented in the field of type FT to the powder structure or scattered structures without orientation, of type UD. Over the 50 mg/L of chloride is produced the opposite effect, grain size began to increase. To add further guar between 15 and 30 mg/L, notes that with 30 g/L of chloride, improves the quality of the deposit, which is optimized increasing current density up to 290 A/m2 and temperature to the 55ºC.

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Author Biographies

Juan Alejandro Aragón Maureira, Profesor Departamento de Ingenierí­a.

Departamento de Ingenieria Academico

Juan Alejandro Camus Arancibia, Profesor del Departamento de Quimica de la Universidad de Playa Ancha

Departamento de Quimica Decano

Published

2011-03-24

How to Cite

Aragón Maureira, J. A., & Camus Arancibia, J. A. (2011). EFFECT OF THE CONCENTRATION OF CHLORIDE ION IN THE STRUCTURE OF ELECTRODEPOSITS OF COPPER. LatinAmerican Journal of Metallurgy and Materials, 128–133. Retrieved from https://rlmm.org/ojs/index.php/rlmm/article/view/106

Issue

Section

Regular Articles